In situ, multiple-multiplier, laser ablation ICP-MS measurement of boron isotopic composition (δ<SUP>11</SUP>B) at the nanogram level

We present a new in situ, multiple electron-multiplier LA-ICP-MS technique for the analysis of boron isotopes (delta(11)B) at < I parts per thousand 2sigma precision and at the nanogram level. Sample materials analyzed were all natural and synthetic glasses, spanning a range of boron concentrations from 0.39 to 30.2 ppm and B-11/B-10 values from 4.0254 to 4.0799 (delta(11)B - 6.08 parts per thousand to + 7.35 parts per thousand). The in situ analyses were duplicated at higher concentrations by solution analyses of chemically separated boron using conventional nebulization on the same ICP-MS system.